Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3537948
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dc.titleTailoring the magnetization reversal in antidot nanostructures using lithographically engineered inhomogeneities
dc.contributor.authorTripathy, D.
dc.contributor.authorVavassori, P.
dc.contributor.authorAdeyeye, A.O.
dc.date.accessioned2014-06-19T03:29:32Z
dc.date.available2014-06-19T03:29:32Z
dc.date.issued2011-04-01
dc.identifier.citationTripathy, D., Vavassori, P., Adeyeye, A.O. (2011-04-01). Tailoring the magnetization reversal in antidot nanostructures using lithographically engineered inhomogeneities. Journal of Applied Physics 109 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3537948
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/71937
dc.description.abstractWe report on tailoring the magnetization reversal mechanism in engineered permalloy antidot nanostructures by lithographically introducing inhomogeneities in the form of neighboring antidots with alternate dimensions. We observed that the magnetic domain configurations are significantly altered when compared to homogeneous antidots due to the dissimilar size of adjacent antidots. The reversal process also is strongly influenced by the relative difference in the size of adjacent antidots and the thickness of the permalloy film. Our results have been further corroborated by micromagnetic simulations and low temperature measurements. © 2011 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3537948
dc.sourceScopus
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.3537948
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume109
dc.description.issue7
dc.description.page-
dc.description.codenJAPIA
dc.identifier.isiut000289952100044
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