Please use this identifier to cite or link to this item: https://doi.org/10.1109/TMAG.2004.830204
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dc.titleSub-100-nm current-perpendicular-to-plane sensor fabrication
dc.contributor.authorZheng, Y.K.
dc.contributor.authorLi, K.B.
dc.contributor.authorQiu, J.J.
dc.contributor.authorHan, G.C.
dc.contributor.authorGuo, Z.B.
dc.contributor.authorZong, B.Y.
dc.contributor.authorAn, L.H.
dc.contributor.authorLuo, P.
dc.contributor.authorLiu, Z.Y.
dc.contributor.authorWu, Y.H.
dc.date.accessioned2014-06-19T03:29:01Z
dc.date.available2014-06-19T03:29:01Z
dc.date.issued2004-07
dc.identifier.citationZheng, Y.K., Li, K.B., Qiu, J.J., Han, G.C., Guo, Z.B., Zong, B.Y., An, L.H., Luo, P., Liu, Z.Y., Wu, Y.H. (2004-07). Sub-100-nm current-perpendicular-to-plane sensor fabrication. IEEE Transactions on Magnetics 40 (4 II) : 2248-2250. ScholarBank@NUS Repository. https://doi.org/10.1109/TMAG.2004.830204
dc.identifier.issn00189464
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/71891
dc.description.abstractTwo sets of processes for sub-100-nm current-perpendicular-to-plane (CPP) spin-valves (SVs) were developed. In the first method, a CPP SV was fabricated by using via-hole instead of small cell patterning. This method makes it easy to characterize the CPP spin valve films. The shunting effect has been analyzed in this method. In the second method, a resist layer for planarization, ionmilling, and wet etching for self-opening vla-hole in a self-aligned fashion by making use of the height difference between the cell and surrounding regions was introduced. This method is suitable for the actual recording heads with small dimension even without an ion-beam-deposition system. CPP sensors with size from 0.05 μm 0.05 μm to 0.4 μm · 0.5μm with different free-layer structures have been investigated by means of the first method.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/TMAG.2004.830204
dc.sourceScopus
dc.subjectCurrent-perpendicular-to-plane (CPP)
dc.subjectGiant magnetoresistance (GMR) effect
dc.subjectProbe recording
dc.subjectSpin-valve (SV)
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1109/TMAG.2004.830204
dc.description.sourcetitleIEEE Transactions on Magnetics
dc.description.volume40
dc.description.issue4 II
dc.description.page2248-2250
dc.description.codenIEMGA
dc.identifier.isiut000223446700085
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