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dc.titleParallel nanostructuring of GeSbTe film with particle mask
dc.contributor.authorWang, Z.B.
dc.contributor.authorHong, M.H.
dc.contributor.authorLukyanchuk, B.S.
dc.contributor.authorHuang, S.M.
dc.contributor.authorWang, Q.F.
dc.contributor.authorShi, L.P.
dc.contributor.authorChong, T.C.
dc.identifier.citationWang, Z.B.,Hong, M.H.,Lukyanchuk, B.S.,Huang, S.M.,Wang, Q.F.,Shi, L.P.,Chong, T.C. (2004-09). Parallel nanostructuring of GeSbTe film with particle mask. Applied Physics A: Materials Science and Processing 79 (4-6) : 1603-1606. ScholarBank@NUS Repository.
dc.description.abstractParallel nanostructuring of a GeSbTe film may significantly improve the recording performance in data storage. In this paper, a method that permits direct and massively parallel nanopatterning of the substrate surface by laser irradiation is investigated. Polystyrene spherical particles were deposited on the surface in a monolayer array by self-assembly, The array was then irradiated with a 248-nm KrF laser. A sub-micron nanodent array can be obtained after single-pulse irradiation. These nanodents change their shapes at different laser energies. The optical near-field distribution around the particles was calculated according to the exact solution of the light-scattering problem. The influence of the presence of the substrate on the optical near field was also studied. The mechanisms for the generation of the nanodent structures are discussed.
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.sourcetitleApplied Physics A: Materials Science and Processing
Appears in Collections:Staff Publications

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