Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3106056
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dc.titleErratum: "band alignment of yttrium oxide on various relaxed and strained semiconductor substrates" (J. Appl. Phys. (2008) 103 (083702))
dc.contributor.authorChiam, S.Y.
dc.contributor.authorChim, W.K.
dc.date.accessioned2014-06-18T05:32:30Z
dc.date.available2014-06-18T05:32:30Z
dc.date.issued2009
dc.identifier.citationChiam, S.Y., Chim, W.K. (2009). Erratum: "band alignment of yttrium oxide on various relaxed and strained semiconductor substrates" (J. Appl. Phys. (2008) 103 (083702)). Journal of Applied Physics 105 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3106056
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/67918
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3106056
dc.sourceScopus
dc.typeOthers
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.3106056
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume105
dc.description.issue7
dc.description.page-
dc.description.codenJAPIA
dc.identifier.isiut000266633500110
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