Please use this identifier to cite or link to this item:
https://doi.org/10.1134/S1027451008060025
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dc.title | Study of microimpurities and charge states in homogeneous hydrocarbon films (Redeposited from a T-10 tokamak deuterium plasma discharge) using XRF analysis, IR spectroscopy, EPR, and I-V characteristics | |
dc.contributor.author | Svechnikov, N.Y. | |
dc.contributor.author | Stankevich, V.G. | |
dc.contributor.author | Men'shikov, K.A. | |
dc.contributor.author | Lebedev, A.M. | |
dc.contributor.author | Kolbasov, B.N. | |
dc.contributor.author | Trunova, V.A. | |
dc.contributor.author | Rajarathnam, D. | |
dc.contributor.author | Kostetski, Y. | |
dc.date.accessioned | 2014-06-17T07:49:25Z | |
dc.date.available | 2014-06-17T07:49:25Z | |
dc.date.issued | 2008-12 | |
dc.identifier.citation | Svechnikov, N.Y., Stankevich, V.G., Men'shikov, K.A., Lebedev, A.M., Kolbasov, B.N., Trunova, V.A., Rajarathnam, D., Kostetski, Y. (2008-12). Study of microimpurities and charge states in homogeneous hydrocarbon films (Redeposited from a T-10 tokamak deuterium plasma discharge) using XRF analysis, IR spectroscopy, EPR, and I-V characteristics. Journal of Surface Investigation 2 (6) : 826-835. ScholarBank@NUS Repository. https://doi.org/10.1134/S1027451008060025 | |
dc.identifier.issn | 10274510 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/64625 | |
dc.description.abstract | Microimpurities and charge states of homogeneous deuterated hydrocarbon films redeposited from a T-10 tokamak deuterium plasma discharge are studied spectroscopically using x-ray fluorescence (XRF) analysis, electron paramagnetic resonance (EPR), infrared (IR) spectroscopy; current-voltage (I-V) charachteristics are also measured. Twelve microimpurities (mainly, those of transition metals Fe, Mo, Cr, Ni, Ti, etc., with relative concentrations of 50-7000 ppm) have been discovered. The resulting broad EPR (9. 9 GHz, 6000 G) line with g-factors of g = 2. 053-2. 093 and g = 4. 3 assigned to paramagnetic impurities confirms their presence. The presence of different charge states on two sides of the film (one facing the plasma and another facing the vacuum-chamber wall) and the difference in the IR spectra of these states are established. This can be explained by the process of film formation under the influence of the tokamak plasma. © 2008 MAIK Nauka. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1134/S1027451008060025 | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | BIOENGINEERING | |
dc.contributor.department | CHEMICAL & BIOMOLECULAR ENGINEERING | |
dc.description.doi | 10.1134/S1027451008060025 | |
dc.description.sourcetitle | Journal of Surface Investigation | |
dc.description.volume | 2 | |
dc.description.issue | 6 | |
dc.description.page | 826-835 | |
dc.identifier.isiut | 000262864900002 | |
Appears in Collections: | Staff Publications |
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