Three-dimensional photonic crystal by holographic contact lithography using a single diffraction mask

Abstract

The authors present an approach for fabrication of three-dimensional (3D) periodic micro-nanoscale structures through holographic contact lithography using a single diffraction mask. The mask functions to split an incoming laser beam into four diffracted beams in an umbrella configuration to produce a 3D periodic interference pattern immediately behind it. The recording photoresist can thus be placed in direct contact with or in close proximity to the mask. The proposed approach was investigated using 3D finite-difference time-domain method. Simulation results confirmed the feasibility of the method. © 2007 American Institute of Physics.