Spray coating of photoresist for 3D microstructures with different geometries

Abstract

This paper presents the advantages of spray coating technique as compared to the conventional spin coating method for photoresist coating of 3D microstructures. An optimized mix of photoresist AZ4620: MEK: PGMEA (1:1.5:0.5) was used to achieve good coverage and uniformity of photoresist not only on planar surface, but also along the trenches' sidewall. In order to achieve the ideal coverage of photoresist layer, the effects of the geometries of the microstructures were also considered. Then, we implement this technique for our application in a MEMS device to prove the viability and potentiality of spray coating of photoresist for fabrication of 3D microstructures. © 2006 IOP Publishing Ltd.