Please use this identifier to cite or link to this item: https://doi.org/10.1007/s00339-005-3227-z
DC FieldValue
dc.titlePulsed laser deposition of lead-zirconate-titanate thin films and multilayered heterostructures
dc.contributor.authorZhu, T.J.
dc.contributor.authorLu, L.
dc.contributor.authorLai, M.O.
dc.date.accessioned2014-06-17T06:31:56Z
dc.date.available2014-06-17T06:31:56Z
dc.date.issued2005-09
dc.identifier.citationZhu, T.J., Lu, L., Lai, M.O. (2005-09). Pulsed laser deposition of lead-zirconate-titanate thin films and multilayered heterostructures. Applied Physics A: Materials Science and Processing 81 (4) : 701-714. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-005-3227-z
dc.identifier.issn09478396
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/61177
dc.description.abstractThere is an increasing interest in lead-zirconate-titanate (PZT) based ferroelectric thin film and devices in recent years. Pulsed laser deposition (PLD) technique has been demonstrated to be a versatile and successful tool for the deposition of epitaxial multi-component metal oxide films and heterostructures. This review presents a reasonable understanding of the relationship between PLD processing and composition, crystal structure and orientation of PZT ferroelectric thin films, and heterostructures. Processing-related issues from PLD of PZT thin films and material-integration strategies developed to fabrication of highly oriented or epitaxial PZT thin film based capacitors with excellent ferroelectric properties are discussed in detail. © Springer-Verlag 2005.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1007/s00339-005-3227-z
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1007/s00339-005-3227-z
dc.description.sourcetitleApplied Physics A: Materials Science and Processing
dc.description.volume81
dc.description.issue4
dc.description.page701-714
dc.description.codenAPAMF
dc.identifier.isiut000230267700008
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