Please use this identifier to cite or link to this item: https://doi.org/10.1021/am301220h
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dc.titleBipolar charge storage characteristics in copper and cobalt co-doped zinc oxide (ZnO) thin film
dc.contributor.authorKumar, A.
dc.contributor.authorHerng, T.S.
dc.contributor.authorZeng, K.
dc.contributor.authorDing, J.
dc.date.accessioned2014-06-17T06:13:53Z
dc.date.available2014-06-17T06:13:53Z
dc.date.issued2012-10-24
dc.identifier.citationKumar, A., Herng, T.S., Zeng, K., Ding, J. (2012-10-24). Bipolar charge storage characteristics in copper and cobalt co-doped zinc oxide (ZnO) thin film. ACS Applied Materials and Interfaces 4 (10) : 5276-5280. ScholarBank@NUS Repository. https://doi.org/10.1021/am301220h
dc.identifier.issn19448244
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/59644
dc.description.abstractThe bipolar charge phenomenon in Cu and Co co-doped zinc oxide (ZnO) film samples has been studied using scanning probe microscopy (SPM) techniques. Those ZnO samples are made using a pulsed laser deposition (PLD) technique. It is found that the addition of Cu and Co dopants suppresses the electron density in ZnO and causes a significant change in the work function (Fermi level) value of the ZnO film; this results in the ohmic nature of the contact between the electrode (probe tip) and codoped sample, whereas this contact exhibits a Schottky nature in the undoped and single-element-doped samples. These results are verified by Kelvin probe force microscopy (KPFM) and ultraviolet photoelectron spectroscopy (UPS) measurements. It is also found that the co-doping (Cu and Co) can stabilize the bipolar charge, whereas Cu doping only stabilizes the positive charge in ZnO thin films. © 2012 American Chemical Society.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1021/am301220h
dc.sourceScopus
dc.subjectbipolar charge
dc.subjectcharge stability
dc.subjectcodoped ZnO
dc.subjectKelvin probe force microscopy
dc.subjectzinc oxide
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1021/am301220h
dc.description.sourcetitleACS Applied Materials and Interfaces
dc.description.volume4
dc.description.issue10
dc.description.page5276-5280
dc.identifier.isiut000310109000031
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