Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2776855
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dc.titleStability of photovoltage and trap of light-induced charges in ferroelectric W O3 -doped (Pb0.97 La0.03) (Zr0.52 Ti0.48) O3 thin films
dc.contributor.authorQin, M.
dc.contributor.authorYao, K.
dc.contributor.authorLiang, Y.C.
dc.contributor.authorGan, B.K.
dc.date.accessioned2014-06-17T03:06:55Z
dc.date.available2014-06-17T03:06:55Z
dc.date.issued2007
dc.identifier.citationQin, M., Yao, K., Liang, Y.C., Gan, B.K. (2007). Stability of photovoltage and trap of light-induced charges in ferroelectric W O3 -doped (Pb0.97 La0.03) (Zr0.52 Ti0.48) O3 thin films. Applied Physics Letters 91 (9) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2776855
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/57503
dc.description.abstractThe stability of photovoltage in W O3 -doped (Pb0.97 La0.03) (Zr0.52 Ti0.48) O3 (PLWZT) ferroelectric thin films was investigated. For in-plane polarized configuration, with a greatly enhanced electrode gap, the reduction ratio of photovoltage during multicycle UV illumination was significantly smaller and stability of photovoltage was greatly improved over the sandwich capacitor configuration. The ferroelectric-metal interfacial effects including Schottky barriers and polarization screening due to the trap of photoinduced charges at interfaces were found to determine the magnitude, stability, and even the polarity of the photovoltage, particularly for the electrode-sandwiched PLWZT thin films. © 2007 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2776855
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.2776855
dc.description.sourcetitleApplied Physics Letters
dc.description.volume91
dc.description.issue9
dc.description.page-
dc.description.codenAPPLA
dc.identifier.isiut000249156100084
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