Please use this identifier to cite or link to this item:
https://doi.org/10.1007/s00339-007-3886-z
DC Field | Value | |
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dc.title | Properties of near and far fields for the electric line source illumination of a lossless metamaterial covered conductor cylinder | |
dc.contributor.author | Wu, Q. | |
dc.contributor.author | Wang, H.-L. | |
dc.contributor.author | Meng, F.-Y. | |
dc.contributor.author | Li, L.-W. | |
dc.contributor.author | Wu, J. | |
dc.date.accessioned | 2014-06-17T03:02:41Z | |
dc.date.available | 2014-06-17T03:02:41Z | |
dc.date.issued | 2007-05 | |
dc.identifier.citation | Wu, Q., Wang, H.-L., Meng, F.-Y., Li, L.-W., Wu, J. (2007-05). Properties of near and far fields for the electric line source illumination of a lossless metamaterial covered conductor cylinder. Applied Physics A: Materials Science and Processing 87 (2) : 335-341. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-007-3886-z | |
dc.identifier.issn | 09478396 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/57136 | |
dc.description.abstract | This work concentrated on an ELS (electric line source) radiating parallel to a lossless metamaterial covered infinitely long conductor cylinder. First, the exact analytical solution of the electromagnetic model is derived. Second, the numerical results based on the solution are given. Under different geometric and electromagnetic parameters, the patterns of the near field are obtained; the directivity and normalized radiation resistance are presented to discuss the properties of the far field. Because of the negative refraction of the metamaterial, it can be seen that there is a distinct "focus" in the metamaterial layer from the near field pattern, which does not exist in conventional material layer. The presented electromagnetic model is compared with the former, simpler model through the directivity and its validity is proven. © Springer-Verlag 2007. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1007/s00339-007-3886-z | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1007/s00339-007-3886-z | |
dc.description.sourcetitle | Applied Physics A: Materials Science and Processing | |
dc.description.volume | 87 | |
dc.description.issue | 2 | |
dc.description.page | 335-341 | |
dc.description.coden | APAMF | |
dc.identifier.isiut | 000249502400034 | |
Appears in Collections: | Staff Publications |
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