Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1496141
DC FieldValue
dc.titlePattern-induced ripple structures at silicon-oxide/silicon interface by excimer laser irradiation
dc.contributor.authorChen, X.Y.
dc.contributor.authorLu, Y.F.
dc.contributor.authorCho, B.J.
dc.contributor.authorZeng, Y.P.
dc.contributor.authorZeng, J.N.
dc.contributor.authorWu, Y.H.
dc.date.accessioned2014-06-17T03:01:07Z
dc.date.available2014-06-17T03:01:07Z
dc.date.issued2002-08-12
dc.identifier.citationChen, X.Y., Lu, Y.F., Cho, B.J., Zeng, Y.P., Zeng, J.N., Wu, Y.H. (2002-08-12). Pattern-induced ripple structures at silicon-oxide/silicon interface by excimer laser irradiation. Applied Physics Letters 81 (7) : 1344-1346. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1496141
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/57001
dc.description.abstractRipple structures by KrF excimer laser irradiation have been observed on a silicon surface capped with a thin layer of patterned silicon oxide. The ripples are highly dependent on the patterns of the silicon oxide. They are centered and enhanced at the boundaries of the opened windows, forming a radial-wavelike structure. The formation of the ripples is attributed to the combined effect of surface stress, surface scattered wave and boundary effects. © 2002 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1496141
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.1496141
dc.description.sourcetitleApplied Physics Letters
dc.description.volume81
dc.description.issue7
dc.description.page1344-1346
dc.description.codenAPPLA
dc.identifier.isiut000177284400064
Appears in Collections:Staff Publications

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