Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2963485
DC FieldValue
dc.titleOrigins of ferromagnetism in transition-metal doped Si
dc.contributor.authorKo, V.
dc.contributor.authorTeo, K.L.
dc.contributor.authorLiew, T.
dc.contributor.authorChong, T.C.
dc.contributor.authorMacKenzie, M.
dc.contributor.authorMacLaren, I.
dc.contributor.authorChapman, J.N.
dc.date.accessioned2014-06-17T03:00:45Z
dc.date.available2014-06-17T03:00:45Z
dc.date.issued2008
dc.identifier.citationKo, V., Teo, K.L., Liew, T., Chong, T.C., MacKenzie, M., MacLaren, I., Chapman, J.N. (2008). Origins of ferromagnetism in transition-metal doped Si. Journal of Applied Physics 104 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2963485
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/56969
dc.description.abstractWe present results of the magnetic, structural, and chemical characterizations of Mn+ -implanted Si displaying n -type semiconducting behavior and ferromagnetic ordering with Curie temperature, TC, well above room temperature. The temperature-dependent magnetization measured by superconducting quantum interference device from 5 to 800 K was characterized by three different critical temperatures (TC* ∼45 K, TC1 ∼630-650 K, and TC2 ∼805-825 K). Their origins were investigated using dynamic secondary ion mass spectroscopy and transmission electron microscopy (TEM) techniques, including electron energy loss spectroscopy, Z -contrast scanning TEM imaging, and electron diffraction. We provided direct evidences of the presence of a small amount of Fe and Cr impurities which were unintentionally doped into the samples together with the Mn+ ions as well as the formation of Mn-rich precipitates embedded in a Mn-poor matrix. The observed TC* is attributed to the Mn4 Si7 precipitates identified by electron diffraction. Possible origins of TC1 and TC2 are also discussed. Our findings raise questions regarding the origin of the high- TC ferromagnetism reported in many material systems without a careful chemical analysis. © 2008 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2963485
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.2963485
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume104
dc.description.issue3
dc.description.page-
dc.description.codenJAPIA
dc.identifier.isiut000258493900100
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