Please use this identifier to cite or link to this item:
https://doi.org/10.1063/1.1609638
DC Field | Value | |
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dc.title | Modeling of charge quantization and wave function penetration effects in a metal-oxide-semiconductor system with ultrathin gate oxide | |
dc.contributor.author | Chim, W.K. | |
dc.contributor.author | Zheng, J.X. | |
dc.contributor.author | Koh, B.H. | |
dc.date.accessioned | 2014-06-17T02:57:15Z | |
dc.date.available | 2014-06-17T02:57:15Z | |
dc.date.issued | 2003-10-15 | |
dc.identifier.citation | Chim, W.K., Zheng, J.X., Koh, B.H. (2003-10-15). Modeling of charge quantization and wave function penetration effects in a metal-oxide-semiconductor system with ultrathin gate oxide. Journal of Applied Physics 94 (8) : 5273-5277. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1609638 | |
dc.identifier.issn | 00218979 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/56671 | |
dc.description.abstract | Charge quantization and wave function penetration effects in a metal-oxide-semiconductor system with ultrathin gate oxide were investigated. The capacitance-voltage (C-V) results were compared with those obtained from other quantum mechanical (QM) simulators. Results showed that the wave function penetration has a non-negligible effect on the gate capacitance and resulting C-V curves when the oxide thickness decreases to 1 nm and below. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1609638 | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1063/1.1609638 | |
dc.description.sourcetitle | Journal of Applied Physics | |
dc.description.volume | 94 | |
dc.description.issue | 8 | |
dc.description.page | 5273-5277 | |
dc.description.coden | JAPIA | |
dc.identifier.isiut | 000185664300084 | |
Appears in Collections: | Staff Publications |
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