Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1609638
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dc.titleModeling of charge quantization and wave function penetration effects in a metal-oxide-semiconductor system with ultrathin gate oxide
dc.contributor.authorChim, W.K.
dc.contributor.authorZheng, J.X.
dc.contributor.authorKoh, B.H.
dc.date.accessioned2014-06-17T02:57:15Z
dc.date.available2014-06-17T02:57:15Z
dc.date.issued2003-10-15
dc.identifier.citationChim, W.K., Zheng, J.X., Koh, B.H. (2003-10-15). Modeling of charge quantization and wave function penetration effects in a metal-oxide-semiconductor system with ultrathin gate oxide. Journal of Applied Physics 94 (8) : 5273-5277. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1609638
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/56671
dc.description.abstractCharge quantization and wave function penetration effects in a metal-oxide-semiconductor system with ultrathin gate oxide were investigated. The capacitance-voltage (C-V) results were compared with those obtained from other quantum mechanical (QM) simulators. Results showed that the wave function penetration has a non-negligible effect on the gate capacitance and resulting C-V curves when the oxide thickness decreases to 1 nm and below.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1609638
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.1609638
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume94
dc.description.issue8
dc.description.page5273-5277
dc.description.codenJAPIA
dc.identifier.isiut000185664300084
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