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Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1568154
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dc.titleFemtosecond laser ablation of polytetrafluoroethylene (Teflon) in ambient air
dc.contributor.authorWang, Z.B.
dc.contributor.authorHong, M.H.
dc.contributor.authorLu, Y.F.
dc.contributor.authorWu, D.J.
dc.contributor.authorLan, B.
dc.contributor.authorChong, T.C.
dc.date.accessioned2014-06-17T02:50:04Z
dc.date.available2014-06-17T02:50:04Z
dc.date.issued2003-05-15
dc.identifier.citationWang, Z.B., Hong, M.H., Lu, Y.F., Wu, D.J., Lan, B., Chong, T.C. (2003-05-15). Femtosecond laser ablation of polytetrafluoroethylene (Teflon) in ambient air. Journal of Applied Physics 93 (10 1) : 6375-6380. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1568154
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/56045
dc.description.abstractThe impact of laser ablation of polytetrafluoroethylene (Teflon) in ambient air was discussed. The importance of Teflon in bioscience and medical applications was also discussed. The quality of the ablated structure was degraded and the ablation efficiency was reduced because of the air ionization effect at high laser fluences. Laser fluence was kept below a critical fluence to obtain high quality microstructures.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1568154
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.1568154
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume93
dc.description.issue10 1
dc.description.page6375-6380
dc.description.codenJAPIA
dc.identifier.isiut000182789700080
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