Please use this identifier to cite or link to this item: https://doi.org/10.1002/smll.200500370
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dc.titleEasy writing of nanopatterns on a polymer film using electrostatic nanolithography
dc.contributor.authorJegadesan, S.
dc.contributor.authorSindhu, S.
dc.contributor.authorValiyaveettil, S.
dc.date.accessioned2014-05-19T02:51:23Z
dc.date.available2014-05-19T02:51:23Z
dc.date.issued2006-04
dc.identifier.citationJegadesan, S., Sindhu, S., Valiyaveettil, S. (2006-04). Easy writing of nanopatterns on a polymer film using electrostatic nanolithography. Small 2 (4) : 481-484. ScholarBank@NUS Repository. https://doi.org/10.1002/smll.200500370
dc.identifier.issn16136810
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/52883
dc.description.abstractThe fabrication of poly(methacrylic acid) nanopatterns, with sub-100 nm feature dimensions, on a silicon substrate using a negatively biased atomic force microscopy (AFM) tip was investigated. The kinetics, growth, and optimization of the conditions for nanopatterning using electrostatic nanolithography of the polymer film were studied. It was observed that the features of nanopatterns created from polymer films depend on the type of polymer used and the applied bias and speed of the AFM tip. This method was found to be a highly versatile, direct-write method to produce well-defined nanostructures on a polymer film.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1002/smll.200500370
dc.sourceScopus
dc.subjectAtomic force microscopy
dc.subjectElectrostatic interactions
dc.subjectNanolithography
dc.subjectPolymers
dc.subjectThin films
dc.typeArticle
dc.contributor.departmentNUS NANOSCIENCE & NANOTECH INITIATIVE
dc.contributor.departmentCHEMISTRY
dc.description.doi10.1002/smll.200500370
dc.description.sourcetitleSmall
dc.description.volume2
dc.description.issue4
dc.description.page481-484
dc.identifier.isiut000235978700004
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