Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2966696
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dc.titleElectrical and magnetic properties of multiferroic BiFeO3 / CoFe2 O4 heterostructure
dc.contributor.authorZheng, R.Y.
dc.contributor.authorWang, J.
dc.contributor.authorRamakrishna, S.
dc.date.accessioned2014-04-24T09:33:01Z
dc.date.available2014-04-24T09:33:01Z
dc.date.issued2008
dc.identifier.citationZheng, R.Y., Wang, J., Ramakrishna, S. (2008). Electrical and magnetic properties of multiferroic BiFeO3 / CoFe2 O4 heterostructure. Journal of Applied Physics 104 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2966696
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/51393
dc.description.abstractTo realize a magnetoelectric heterostructure with desired ferroelectric and magnetic properties, a heterostructure consisting of BiFeO3 (BFO) / CoFe2 O4 (CFO) layers has been grown on SrRuO3 buffered Pt/ TiO2 / SiO2 /Si substrate by rf sputtering. X-ray diffraction shows that the BFO and CFO phases have been successfully retained in the heterostructure. Grain growth of the CFO phase was enhanced on top of the BFO layer. The heterostructure exhibits both ferroelectric and magnetic behaviors at room temperature. Its remanent polarization (2 Pr) is measured to be ∼146 μC/ cm2 and the coercive field (2 Ec) is ∼1803 kV/cm, while the saturation magnetization (2 Ms) is 140 emu/ cm3 and the coercive field (2 Hc) is ∼2.7 kOe. The leakage current behavior of the heterostructure is consistent with space charge limited conduction mechanism. While the heterostructure is promising for multiferroic behavior, it would be necessary to control the structural defects such that the leakage is minimized. © 2008 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2966696
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMECHANICAL ENGINEERING
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.description.doi10.1063/1.2966696
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume104
dc.description.issue3
dc.description.page-
dc.description.codenJAPIA
dc.identifier.isiut000258493900115
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