Please use this identifier to cite or link to this item:
|Title:||Creating polymer structures of tunable electric functionality by nanoscale discharge-assisted cross-linking and oxygenation||Authors:||Xie, X.N.
|Issue Date:||1-Mar-2006||Citation:||Xie, X.N., Deng, M., Xu, H., Yang, S.W., Qi, D.C., Gao, X.Y., Chung, H.J., Sow, C.H., Tan, V.B.C., Wee, A.T.S. (2006-03-01). Creating polymer structures of tunable electric functionality by nanoscale discharge-assisted cross-linking and oxygenation. Journal of the American Chemical Society 128 (8) : 2738-2744. ScholarBank@NUS Repository. https://doi.org/10.1021/ja0577241||Abstract:||We report the creation of polymeric micro/nanostructures which exhibit distinct chemical and physical characteristics from the matrix poly(N-vinyl carbazole) (PVK). The structure formation is based on atomic force microscopy (AFM) facilitated cross-linking and oxygenation. The reaction of PVK with AFM lithographically induced nanoscale discharge produces raised structures in which bridge oxygen links neighboring carbazole groups. The cross-linking by bridge oxygen converts the initially insulating PVK matrix to chemically modified conducting patterns through the formation of extended π-conjugations. A comprehensive AFM, PES (photoelectron spectroscopy), FTIR (Fourier transform infrared spectroscopy), and DFT (density functional theory) analysis is presented to address the chemophysical identity of the patterned structures. Our results demonstrate new capabilities of AFM nanolithography in generating heterogeneous functional structures in a polymer matrix. © 2006 American Chemical Society.||Source Title:||Journal of the American Chemical Society||URI:||http://scholarbank.nus.edu.sg/handle/10635/51364||ISSN:||00027863||DOI:||10.1021/ja0577241|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Oct 26, 2020
WEB OF SCIENCETM
checked on Oct 19, 2020
checked on Oct 24, 2020
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.