Please use this identifier to cite or link to this item: https://doi.org/10.1109/TMAG.2007.893135
DC FieldValue
dc.titleFePt patterned media fabricated by deep UV lithography followed by sputtering or PLD
dc.contributor.authorQiu, L.J.
dc.contributor.authorDing, J.
dc.contributor.authorAdeyeye, A.O.
dc.contributor.authorYin, J.H.
dc.contributor.authorChen, J.S.
dc.contributor.authorGoolaup, S.
dc.contributor.authorSingh, N.
dc.date.accessioned2014-04-24T08:35:17Z
dc.date.available2014-04-24T08:35:17Z
dc.date.issued2007-06
dc.identifier.citationQiu, L.J., Ding, J., Adeyeye, A.O., Yin, J.H., Chen, J.S., Goolaup, S., Singh, N. (2007-06). FePt patterned media fabricated by deep UV lithography followed by sputtering or PLD. IEEE Transactions on Magnetics 43 (6) : 2157-2159. ScholarBank@NUS Repository. https://doi.org/10.1109/TMAG.2007.893135
dc.identifier.issn00189464
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/51169
dc.description.abstractContinuous and patterned FePt films (40 nm) were fabricated on silicon (100) substrates using deep ultraviolet lithography with the wavelength of 248 nm followed by sputter deposition or pulsed laser deposition at room temperature, liftoff, and postannealing in vacuum. The structures and magnetic properties of the films were characterized by X-ray diffractometry, X-ray photoelectron spectroscopy, scanning electron microscopy, and alternating gradient force magnetometry. A buffer layer of Ag or MgO was inserted between the Si substrate and FePt to prevent a chemical reaction between Si and FePt. The phase transformation from face-centered cubic to face-centered tetragonal started after annealing at 400°C for continuous films, while for the patterned FePt films, phase formation was retarded. High coercivities of 10-15 kOe have shown potential in hard magnetic applications. The effects of Ag and MgO top layers on the coercivities were also investigated. © 2007 IEEE.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/TMAG.2007.893135
dc.sourceScopus
dc.subjectDeep ultraviolet lithography
dc.subjectFePt
dc.subjectPatterned media
dc.subjectPulsed laser deposition
dc.subjectSputtering
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.contributor.departmentPHYSICS
dc.description.doi10.1109/TMAG.2007.893135
dc.description.sourcetitleIEEE Transactions on Magnetics
dc.description.volume43
dc.description.issue6
dc.description.page2157-2159
dc.description.codenIEMGA
dc.identifier.isiut000246706200026
Appears in Collections:Staff Publications

Show simple item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.