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Please use this identifier to cite or link to this item: https://doi.org/10.1002/1521-4095(20020104)14:1<64
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dc.titleCarbon nanowalls grown by microwave plasma enhanced chemical vapor deposition
dc.contributor.authorWu, Y.
dc.contributor.authorQiao, P.
dc.contributor.authorChong, T.
dc.contributor.authorShen, Z.
dc.date.accessioned2014-04-24T07:19:58Z
dc.date.available2014-04-24T07:19:58Z
dc.date.issued2002-01-04
dc.identifier.citationWu, Y.,Qiao, P.,Chong, T.,Shen, Z. (2002-01-04). Carbon nanowalls grown by microwave plasma enhanced chemical vapor deposition. Advanced Materials 14 (1) : 64-67. ScholarBank@NUS Repository. <a href="https://doi.org/10.1002/1521-4095(20020104)14:1<64" target="_blank">https://doi.org/10.1002/1521-4095(20020104)14:1<64</a>
dc.identifier.issn09359648
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/50876
dc.description.abstractNanowalls, a new nanostructural morphology of carbon, grow instead of nanotubes under microwave plasma-enhanced CVD conditions on substrates electrically disconnected from the lower electrode. While not fully understood, the formation of nanowalls appears to depend on the local electric field. Due to their large surface, nanotubes may find applications in field emission displays and energy storage devices.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1002/1521-4095(20020104)14:1<64
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.departmentPHYSICS
dc.description.doi10.1002/1521-4095(20020104)14:1<64
dc.description.sourcetitleAdvanced Materials
dc.description.volume14
dc.description.issue1
dc.description.page64-67
dc.description.codenADVME
dc.identifier.isiut000173310400016
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