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Please use this identifier to cite or link to this item: https://doi.org/10.1007/s00339-010-5700-6
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dc.titleThe high frequency magnetic properties of self assembled Fe-Co-Si-N nanogranular thin films
dc.contributor.authorLiu, Y.
dc.contributor.authorLiu, Z.W.
dc.contributor.authorTan, C.Y.
dc.contributor.authorOng, C.K.
dc.contributor.authorRamanujan, R.V.
dc.contributor.authorTan, C.Y.
dc.contributor.authorZhao, X.
dc.contributor.authorLiu, E.
dc.date.accessioned2011-09-29T06:43:05Z
dc.date.available2011-09-29T06:43:05Z
dc.date.issued2010
dc.identifier.citationLiu, Y., Liu, Z.W., Tan, C.Y., Ong, C.K., Ramanujan, R.V., Tan, C.Y., Zhao, X., Liu, E. (2010). The high frequency magnetic properties of self assembled Fe-Co-Si-N nanogranular thin films. Applied Physics A: Materials Science and Processing 100 (1) : 257-263. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-010-5700-6
dc.identifier.issn09478396
dc.identifier.issn14320630
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/27423
dc.description.abstractThe effect of a variation in Si and N concentration on the microstructure, crystal structure and high-frequency magnetic properties of Fe-Co-Si-N nanogranular thin films was investigated. The films, prepared by rf magnetron sputtering, consisted of nanosized grains of FeCo as well as a Si and N rich intergranular amorphous phase. The Si concentration had a significant effect on the crystal structure of the FeCo phase. The resistivities of the Fe-Co-Si-N films were significantly enhanced by an increase in Si concentration. The resonant frequency of the Fe-Co-Si-N films could be tuned from 0.45 GHz to 2.1 GHz by controlling Si concentration. The N concentration greatly influenced magnetic properties and the variation in resonant frequency is in agreement with Kittel's equation. © 2010 Springer-Verlag.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1007/s00339-010-5700-6
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHARMACOLOGY
dc.contributor.departmentPHYSICS
dc.description.doi10.1007/s00339-010-5700-6
dc.description.sourcetitleApplied Physics A: Materials Science and Processing
dc.description.volume100
dc.description.issue1
dc.description.page257-263
dc.identifier.isiut000279127700038
dc.published.statePublished
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