Please use this identifier to cite or link to this item:
https://doi.org/10.1109/FLEPS.2019.8792259
DC Field | Value | |
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dc.title | Impact of Ti Interfacial Layer on Resistive Switching Characteristics at sub-μA Current Level in SiO<sub>x</sub>-Based Flexible Cross-Point RRAM | |
dc.contributor.author | Samanta, Subhranu | |
dc.contributor.author | Zhang, Panpan | |
dc.contributor.author | Han, Kaizhen | |
dc.contributor.author | Gong, Xiao | |
dc.contributor.author | Chakraborty, Sandipan | |
dc.contributor.author | Li, Yida | |
dc.contributor.author | Fong, Xuanyao | |
dc.date.accessioned | 2023-11-08T04:00:45Z | |
dc.date.available | 2023-11-08T04:00:45Z | |
dc.date.issued | 2019 | |
dc.identifier.citation | Samanta, Subhranu, Zhang, Panpan, Han, Kaizhen, Gong, Xiao, Chakraborty, Sandipan, Li, Yida, Fong, Xuanyao (2019). Impact of Ti Interfacial Layer on Resistive Switching Characteristics at sub-μA Current Level in SiO<sub>x</sub>-Based Flexible Cross-Point RRAM. 1st IEEE International Conference on Flexible and Printable Sensors and Systems (IEEE FLEPS). ScholarBank@NUS Repository. https://doi.org/10.1109/FLEPS.2019.8792259 | |
dc.identifier.isbn | 9781538693049 | |
dc.identifier.uri | https://scholarbank.nus.edu.sg/handle/10635/245806 | |
dc.description.abstract | The impact of Ti interfacial layer on resistive switching characteristics in 5×5 μm2 Ni/Ti/SiOx /Ni flexible cross-point resistive random access memory (RRAM) structure for the first time. Devices with Ti buffer layer exhibits bipolar resistive switching (BRS) with large memory window (HRS/LRS) of > 103 at 500 nA current compliance (CC). Thin 4-nm Ti interfacial layer regulates the migration of oxygen ions (O-2) and controls BRS process. Highly non-linear (non-linearity of > 22) switching (rectifying ratio i.e, RR of >4×103) is obtained from reference sample without (W/O) Ti buffer layer. | |
dc.publisher | IEEE | |
dc.source | Elements | |
dc.subject | Science & Technology | |
dc.subject | Technology | |
dc.subject | Engineering, Manufacturing | |
dc.subject | Engineering, Electrical & Electronic | |
dc.subject | Instruments & Instrumentation | |
dc.subject | Materials Science, Multidisciplinary | |
dc.subject | Engineering | |
dc.subject | Materials Science | |
dc.subject | Flexible | |
dc.subject | RRAM | |
dc.subject | SiOx | |
dc.subject | Low CC | |
dc.type | Conference Paper | |
dc.date.updated | 2023-11-05T09:28:41Z | |
dc.contributor.department | ELECTRICAL AND COMPUTER ENGINEERING | |
dc.description.doi | 10.1109/FLEPS.2019.8792259 | |
dc.description.sourcetitle | 1st IEEE International Conference on Flexible and Printable Sensors and Systems (IEEE FLEPS) | |
dc.published.state | Published | |
Appears in Collections: | Elements Staff Publications |
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Samanta et al. - 2019 - Impact of Ti Interfacial Layer on Resistive Switching Characteristics at sub-µA Current Level in SiO x -Based F.pdf | Published version | 1.06 MB | Adobe PDF | CLOSED | None |
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