Please use this identifier to cite or link to this item: https://doi.org/10.1109/OMN.2016.7565837
DC FieldValue
dc.titleLoss Characterization of Waveguides in Lithium Niobate on Insulator
dc.contributor.authorSiew, Shawn Yohanes
dc.contributor.authorCheung, Eric Jun Hao
dc.contributor.authorTsang, Mankei
dc.contributor.authorDanner, Aaron James
dc.date.accessioned2022-04-18T06:06:20Z
dc.date.available2022-04-18T06:06:20Z
dc.date.issued2016-01-01
dc.identifier.citationSiew, Shawn Yohanes, Cheung, Eric Jun Hao, Tsang, Mankei, Danner, Aaron James (2016-01-01). Loss Characterization of Waveguides in Lithium Niobate on Insulator. International Conference on Optical MEMS and Nanophotonics (OMN). ScholarBank@NUS Repository. https://doi.org/10.1109/OMN.2016.7565837
dc.identifier.isbn9781509010356
dc.identifier.issn2160-5033
dc.identifier.issn2160-5041
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/219238
dc.description.abstractSingle crystal lithium niobate is a commonly used in optical electronic applications due to its variety of optical effects. However, it is a fairly difficult material to pattern and etching typically induces rough sidewalls. As a result of these limitations, commercial devices are typically use diffusion-type processes which only creates a small index increase. These devices have large footprints and therefore are costly. Lithium niobate on insulator (LNOI) is a technology created to circumvent some of these problems. It consist of a thin film of lithium niobate bonded to an insulating layer, which is then bonded to a host substrate. This allows compact structures due to the higher index confinement achievable. However, propagation loss is still prohibitive, due to the roughness induced by etching processes. We seek to characterize the propagation loss of waveguides in LNOI, and also to reduce the propagation losses.
dc.publisherIEEE
dc.sourceElements
dc.subjectLithium Niobate
dc.subjectOptical Waveguides
dc.subjectPhotonics
dc.typeConference Paper
dc.date.updated2022-04-15T03:20:11Z
dc.contributor.departmentELECTRICAL AND COMPUTER ENGINEERING
dc.contributor.departmentNUS NANOSCIENCE & NANOTECH INITIATIVE
dc.description.doi10.1109/OMN.2016.7565837
dc.description.sourcetitleInternational Conference on Optical MEMS and Nanophotonics (OMN)
dc.published.statePublished
Appears in Collections:Staff Publications
Elements

Show simple item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
Siew Cheung Tsang Danner_OMN2016.pdfSubmitted version366.15 kBAdobe PDF

OPEN

Post-printView/Download

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.