Please use this identifier to cite or link to this item: https://doi.org/10.1109/VLSIT.2018.8510658
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dc.titleIntegration of 2D Black Phosphorus Phototransistor and Silicon Photonics Waveguide System Towards Mid-Infrared On-Chip Sensing Applications
dc.contributor.authorHUANG LI
dc.contributor.authorDONG BOWEI
dc.contributor.authorGuo, Xin
dc.contributor.authorCHANG YUHUA
dc.contributor.authorCHEN CHI-NAN
dc.contributor.authorHUANG XIN
dc.contributor.authorWang, Hong
dc.contributor.authorLEE CHENGKUO
dc.contributor.authorANG KAH WEE
dc.date.accessioned2020-12-02T02:15:47Z
dc.date.available2020-12-02T02:15:47Z
dc.date.issued2018-10-25
dc.identifier.citationHUANG LI, DONG BOWEI, Guo, Xin, CHANG YUHUA, CHEN CHI-NAN, HUANG XIN, Wang, Hong, LEE CHENGKUO, ANG KAH WEE (2018-10-25). Integration of 2D Black Phosphorus Phototransistor and Silicon Photonics Waveguide System Towards Mid-Infrared On-Chip Sensing Applications. Digest of Technical Papers - Symposium on VLSI Technology : 161-162. ScholarBank@NUS Repository. https://doi.org/10.1109/VLSIT.2018.8510658
dc.identifier.isbn9781538642160
dc.identifier.issn0743-1562
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/184402
dc.description.abstractWe demonstrate the first black phosphorus phototransistor integrated with Si photonics waveguide system towards mid-infrared (MIR) sensing. At a wavelength of 3.78 μm, the black phosphorus phototransistor achieves a high responsivity of 0.7 A/W under a small drain bias of-1 V at room-temperature. Additionally, the device offers gate and drain bias tunability to suppress dark current while simultaneously optimize photo-response performance. Our results reveal the potential of black phosphorus for MIR detection to enable the realization of integrated on-chip systems for MIR sensing applications.
dc.publisherInstitute of Electrical and Electronics Engineers Inc.
dc.typeConference Paper
dc.contributor.departmentELECTRICAL AND COMPUTER ENGINEERING
dc.description.doi10.1109/VLSIT.2018.8510658
dc.description.sourcetitleDigest of Technical Papers - Symposium on VLSI Technology
dc.description.page161-162
dc.published.statePublished
dc.grant.idNRF-CRP15-2015-01
dc.grant.idNRF-CRP15-2015-02
dc.grant.fundingagencyNational Research Foundation Singapore
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