Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.4973761
DC FieldValue
dc.titleLow-field switchable dynamic anisotropy in FeCoN thin film with weak stripe domain
dc.contributor.authorWu, Y.P
dc.contributor.authorYang, Y
dc.contributor.authorYang, Z.H
dc.contributor.authorZong, B
dc.contributor.authorDing, J
dc.date.accessioned2020-11-17T06:33:06Z
dc.date.available2020-11-17T06:33:06Z
dc.date.issued2017
dc.identifier.citationWu, Y.P, Yang, Y, Yang, Z.H, Zong, B, Ding, J (2017). Low-field switchable dynamic anisotropy in FeCoN thin film with weak stripe domain. AIP Advances 7 (5) : 56003. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4973761
dc.identifier.issn2158-3226
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/183532
dc.description.abstractIn this work, the static and dynamic magnetic properties of FeCoN films with various thickness have been studied. By controlling the deposition conditions, two-fold static anisotropies, namely a perpendicular anisotropy and an in-plane anisotropy, are introduced into the films, forming weak stripe domain. It is found that, for the films with the thickness between 130 nm and 240 nm, the anisotropy of FMR response is switchable. More importantly, the switching field of the dynamic anisotropy is only about 40-50 Oe, which is far below the value required to switch traditional rotatable anisotropy. Combined with high magnetic permeability and low-field switchable anisotropy, these films are promising for practical applications in the microwave devices. © 2017 Author(s).
dc.publisherAmerican Institute of Physics
dc.rightsAttribution 4.0 International
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.sourceUnpaywall 20201031
dc.subjectMagnetic permeability
dc.subjectMicrowave devices
dc.subjectThin films
dc.subjectDeposition conditions
dc.subjectFeCoN films
dc.subjectIn-plane anisotropy
dc.subjectPerpendicular anisotropy
dc.subjectRotatable anisotropy
dc.subjectStripe domain
dc.subjectSwitchable
dc.subjectSwitching field
dc.subjectAnisotropy
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.contributor.departmentTEMASEK LABORATORIES
dc.description.doi10.1063/1.4973761
dc.description.sourcetitleAIP Advances
dc.description.volume7
dc.description.issue5
dc.description.page56003
dc.published.statePublished
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