Please use this identifier to cite or link to this item: https://doi.org/10.1002/advs.201500405
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dc.titleRecent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage
dc.contributor.authorGuan, C
dc.contributor.authorWang, J
dc.date.accessioned2020-11-10T07:53:06Z
dc.date.available2020-11-10T07:53:06Z
dc.date.issued2016
dc.identifier.citationGuan, C, Wang, J (2016). Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage. Advanced Science 3 (10) : 1500405. ScholarBank@NUS Repository. https://doi.org/10.1002/advs.201500405
dc.identifier.issn21983844
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/183314
dc.description.abstractElectrode materials play a decisive role in almost all electrochemical energy storage devices, determining their overall performance. Proper selection, design and fabrication of electrode materials have thus been regarded as one of the most critical steps in achieving high electrochemical energy storage performance. As an advanced nanotechnology for thin films and surfaces with conformal interfacial features and well controllable deposition thickness, atomic layer deposition (ALD) has been successfully developed for deposition and surface modification of electrode materials, where there are considerable issues of interfacial and surface chemistry at atomic and nanometer scale. In addition, ALD has shown great potential in construction of novel nanostructured active materials that otherwise can be hardly obtained by other processing techniques, such as those solution-based processing and chemical vapor deposition (CVD) techniques. This review focuses on the recent development of ALD for the design and delivery of advanced electrode materials in electrochemical energy storage devices, where typical examples will be highlighted and analyzed, and the merits and challenges of ALD for applications in energy storage will also be discussed. @ 2016 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
dc.rightsAttribution 4.0 International
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.sourceUnpaywall 20201031
dc.subjectAtoms
dc.subjectChemical vapor deposition
dc.subjectDeposition
dc.subjectElectrochemical electrodes
dc.subjectElectrodes
dc.subjectEnergy storage
dc.subjectFilms
dc.subjectNanostructures
dc.subjectStorage (materials)
dc.subjectSurface chemistry
dc.subjectSurface treatment
dc.subjectVapor deposition
dc.subjectAdvanced electrodes
dc.subjectChemical vapor depositions (CVD)
dc.subjectDeposition thickness
dc.subjectElectrochemical energy storage
dc.subjectElectrochemical energy storage devices
dc.subjectElectrode material
dc.subjectInterfacial features
dc.subjectProcessing technique
dc.subjectAtomic layer deposition
dc.typeReview
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.description.doi10.1002/advs.201500405
dc.description.sourcetitleAdvanced Science
dc.description.volume3
dc.description.issue10
dc.description.page1500405
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