Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/177891
Title: EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS
Authors: CHOO CHONG KHENG
Issue Date: 1997
Citation: CHOO CHONG KHENG (1997). EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS. ScholarBank@NUS Repository.
URI: https://scholarbank.nus.edu.sg/handle/10635/177891
Appears in Collections:Master's Theses (Restricted)

Show full item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
b20612862.pdf7.46 MBAdobe PDF

RESTRICTED

NoneLog In

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.