PULSED-LASER INDUCED RIPPLE PATTERNS IN SILICON SUBSTRATES

Abstract

In this thesis, the laser-induced periodic surface structure (LIPSS) for SiO2 / Si was studied using optical and morphology characterization techniques. The factor, such as laser fluence, laser pulse number, laser beam size, laser incident angle, SiO2 layer thickness, sputtered SiO2 after RTA with different RTA time and temperature, different doping type substrates, different initial substrate temperature, which will effect the ripple formation was studied. And also calculations have been made using SLIM program to study excimer laser induced melting and ripple formation on bare Si and SiO2/Si interface. There are also some literature review parts included, which are belief introductions on experimental results and models for ripple formation. At the end, it is the outline of this thesis and some directions for future research.