Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/174830
Title: R & D AND PATENT SYSTEM
Authors: NG JYH PYNG
Issue Date: 1998
Citation: NG JYH PYNG (1998). R & D AND PATENT SYSTEM. ScholarBank@NUS Repository.
Abstract: Technological advancement is vital to a country's economic growth, as it economizes production processes and improves consumer welfare. Undoubtedly, an essential source of such technological improvements comes from R&D activities. Hence a government's insistence on cultivating a conducive environment for optimal R&D activities is both comprehensible and crucial. Many policies have been recommended but patent protection, by far, is the most efficient method. Yet, one question remains - How should a patent grant be designed so that the maximum rate of innovation can be induced? Incidentally, my paper attempts to shed some light on this issue. Specifically, the paper focuses on one aspect of a patent protection - patent breadth. It seeks to prove that neither too narrow nor too broad a patent protection is able to spur substantial interests in R&D activities. Between these two extreme points, theoretically, lies a growth-maximizing patent breadth that maximizes the rate of innovation. These propositions are, in turn, supported by mathematical proofs.
URI: https://scholarbank.nus.edu.sg/handle/10635/174830
Appears in Collections:Bachelor's Theses

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