Please use this identifier to cite or link to this item: https://doi.org/10.1038/srep31637
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dc.titleSuper-focusing of center-covered engineered microsphere
dc.contributor.authorWu, M
dc.contributor.authorChen, R
dc.contributor.authorSoh, J
dc.contributor.authorShen, Y
dc.contributor.authorJiao, L
dc.contributor.authorWu, J
dc.contributor.authorChen, X
dc.contributor.authorJi, R
dc.contributor.authorHong, M
dc.date.accessioned2020-09-02T06:51:26Z
dc.date.available2020-09-02T06:51:26Z
dc.date.issued2016
dc.identifier.citationWu, M, Chen, R, Soh, J, Shen, Y, Jiao, L, Wu, J, Chen, X, Ji, R, Hong, M (2016). Super-focusing of center-covered engineered microsphere. Scientific Reports 6 : 31637. ScholarBank@NUS Repository. https://doi.org/10.1038/srep31637
dc.identifier.issn20452322
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/173997
dc.description.abstractEngineered microsphere possesses the advantage of strong light manipulation at sub-wavelength scale and emerges as a promising candidate to shrink the focal spot size. Here we demonstrated a center-covered engineered microsphere which can adjust the transverse component of the incident beam and achieve a sharp photonic nanojet. Modification of the beam width and working distance of the photonic nanojet were achieved by tuning the cover ratio of the engineered microsphere, leading to a sharp spot size which exceeded the optical diffraction limit. At a wavelength of 633 nm, a focal spot of 245 nm (0.387 ?) was achieved experimentally under plane wave illumination. Strong localized field with Bessel-like distribution was demonstrated by employing the linearly polarized beam and a center-covered mask being engineered on the microsphere. © The Author(s) 2016.
dc.sourceUnpaywall 20200831
dc.typeArticle
dc.contributor.departmentBIOMEDICAL ENGINEERING
dc.contributor.departmentELECTRICAL AND COMPUTER ENGINEERING
dc.description.doi10.1038/srep31637
dc.description.sourcetitleScientific Reports
dc.description.volume6
dc.description.page31637
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