Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/158745
Title: A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
Authors: CHONG PEI FEN
Issue Date: 2001
Citation: CHONG PEI FEN (2001). A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS. ScholarBank@NUS Repository.
URI: https://scholarbank.nus.edu.sg/handle/10635/158745
Appears in Collections:Master's Theses (Restricted)

Show full item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
b22769237.PDF4.69 MBAdobe PDF

RESTRICTED

NoneLog In

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.