Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.apsusc.2017.09.135
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dc.titleTi1-xSnxO2 Nanofilms:Layer-by-layer Deposition with extended Sn solubility and Characterization
dc.contributor.authorYONG ZHIHUA
dc.contributor.authorJiajun Linghu
dc.contributor.authorShibo Xi
dc.contributor.authorHui Ru Tan
dc.contributor.authorSHEN LEI
dc.contributor.authorYang Ping
dc.contributor.authorHui Kim Hui
dc.contributor.authorJian Qing Cao
dc.contributor.authorMeng Lee Leek
dc.contributor.authorYIN XINMAO
dc.contributor.authorFENG YUAN PING
dc.contributor.authorPan Jisheng
dc.date.accessioned2017-11-08T02:00:50Z
dc.date.available2017-11-08T02:00:50Z
dc.date.issued2018-01-15
dc.identifier.citationYONG ZHIHUA, Jiajun Linghu, Shibo Xi, Hui Ru Tan, SHEN LEI, Yang Ping, Hui Kim Hui, Jian Qing Cao, Meng Lee Leek, YIN XINMAO, FENG YUAN PING, Pan Jisheng (2018-01-15). Ti1-xSnxO2 Nanofilms:Layer-by-layer Deposition with extended Sn solubility and Characterization. Applied Surface Science 428 : 710-717. ScholarBank@NUS Repository. https://doi.org/10.1016/j.apsusc.2017.09.135
dc.identifier.issn01694332
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/137321
dc.description.abstractHigh quality rutile Ti1-xSnxO2 nanofilms were successfully grown in a layer-by-layer mode at a moderately low temperature of 400oC using pulsed laser deposition (PLD). High solid solubility of up to x = 0.216 has been achieved in the Ti1-xSnxO2 films despite theoretical prediction by Density functional theory (DFT) of large formation energy (~5.64 eV) required for the substitutional alloy to exist at such high Sn concentration. The resultant films have smooth interfaces and step-terraced surfaces with well controlled stoichiometry and are optically transparent. Sn L3-edge Extended X-ray absorption fine structure (EXAFS) reveals the substitution of Sn4+ in the Ti4+ lattice sites of TiO2. The lattice spacing along [110] increases linearly with increment in x due to substitution of Sn4+ ions in the Ti lattice sites of the Ti1-xSnxO2 films. X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering (RBS) show that Sn is uniformly distributed on the surface and in the bulk of the films. These results are crucial when considering Ti1-xSnxO2 with suitable composition for making TiO2 based quantum structures in advanced optoelectronic devices and solar energy materials, where high-quality crystalline thin film-substrates are important.
dc.description.urihttps://www.sciencedirect.com/science/article/pii/S0169433217327836
dc.language.isoen
dc.publisherElsevier: Applied Surface Science
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 International
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subjectTiO2 thin films
dc.subjectPulsed laser deposition (PLD)
dc.subjectXPS (X-ray photoelectron spectroscopy)
dc.subjectHRTEM
dc.subjectEXAFS
dc.subjectXRD diffraction
dc.subjectReciprocal space mapping
dc.subjectRHEED
dc.subjectRBS
dc.subjectAFM (atomic force microscopy)
dc.subjectDFT calculation
dc.typeArticle
dc.contributor.departmentCENTRE FOR QUANTUM TECHNOLOGIES/PHYSICS
dc.contributor.departmentDEPT OF MECHANICAL ENGINEERING
dc.contributor.departmentNANOSCIENCE AND NANOSCIENCE INITIATIVE
dc.contributor.departmentSINGAPORE SYNCHROTRON LIGHT SOURCE
dc.description.doi10.1016/j.apsusc.2017.09.135
dc.description.sourcetitleApplied Surface Science
dc.description.volume428
dc.description.page710-717
dc.identifier.isiut000415227000088
dc.published.statePublished
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