Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/13529
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dc.titleMOCVD growth and characterization of wide band gap group III-nitride semiconductors
dc.contributor.authorLI PENG
dc.date.accessioned2010-04-08T10:33:57Z
dc.date.available2010-04-08T10:33:57Z
dc.date.issued2003-09-30
dc.identifier.citationLI PENG (2003-09-30). MOCVD growth and characterization of wide band gap group III-nitride semiconductors. ScholarBank@NUS Repository.
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/13529
dc.description.abstractIn this thesis, five key areas of GaN research were addressed, namely: the growth and characterization of undoped GaN on sapphire, the growth and characterization of InGaN thin films and the formation of In-rich quantum dots as well as the carrier recombination mechanisms of InGaN, InGaN/GaN MQW, the epitaxial lateral overgrowth (ELO) of GaN, the growth of p-type GaN with a multi-layered buffer (MLB) on sapphire, the growth and characterization of GaN and InGaN/GaN MQWs with MLBs on Si substrates.
dc.language.isoen
dc.subjectMOCVD, GaN, InGaN, epitaxy, Photoluminescence, ELO
dc.typeThesis
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.supervisorCHUA SOO JIN
dc.description.degreePh.D
dc.description.degreeconferredDOCTOR OF PHILOSOPHY
dc.identifier.isiutNOT_IN_WOS
Appears in Collections:Ph.D Theses (Open)

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