FUNCTIONAL THIN FILMS BY SPATIAL ATOMIC LAYER DEPOSITION FOR PHOTOVOLTAIC APPLICATIONS

Abstract

This thesis focuses on the development and analysis of thin films deposited by spatial atomic layer deposition for application in the photovoltaic industry. The atomic layer deposition technique offers good uniformity, conformality and precise film thickness control. The spatial atomic layer deposition technique combines a high throughput with the advantages of conventional atomic layer deposition in obtaining monolayer-by-monolayer growth at a relatively lower cost. The fabrication and development of aluminium oxide films for surface passivation in silicon wafer solar cells and zinc oxide (undoped and doped) films for application as transparent conductive oxides in thin film solar cells and heterojunction silicon solar cells is investigated using this industrially-relevant technique. A detailed understanding of the film properties and their deposition mechanisms is obtained by a series of electrical, optical and structural characterisation techniques. Finally, the application of these films in homojunction and heterojunction crystalline silicon wafer solar cells is also presented.