Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.physleta.2014.12.007
DC FieldValue
dc.titleX-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy
dc.contributor.authorKalaiselvi, Shenbaga M. P.
dc.contributor.authorTan, Augustine Tuck Lee
dc.contributor.authorTalebitaher, Alireza R.
dc.contributor.authorLee, Paul
dc.contributor.authorHeussler, Sascha Pierre
dc.contributor.authorBreese, Mark Brian H.
dc.contributor.authorRawat, Rajdeepsingh
dc.date.accessioned2016-04-29T08:30:59Z
dc.date.available2016-04-29T08:30:59Z
dc.date.issued2015
dc.identifier.citationKalaiselvi, Shenbaga M. P., Tan, Augustine Tuck Lee, Talebitaher, Alireza R., Lee, Paul, Heussler, Sascha Pierre, Breese, Mark Brian H., Rawat, Rajdeepsingh (2015). X-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy. Physics Letters, Section A: General, Atomic and Solid State Physics 379 (6) : 560-569. ScholarBank@NUS Repository. https://doi.org/10.1016/j.physleta.2014.12.007
dc.identifier.issn03759601
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/123571
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.physleta.2014.12.007
dc.publisherElsevier
dc.typeArticle
dc.contributor.departmentSINGAPORE SYNCHROTRON LIGHT SOURCE
dc.contributor.departmentPHYSICS
dc.description.doi10.1016/j.physleta.2014.12.007
dc.description.sourcetitlePhysics Letters, Section A: General, Atomic and Solid State Physics
dc.description.volume379
dc.description.issue6
dc.description.page560-569
dc.identifier.isiut000349586000009
dc.published.statepublished
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