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Title: Magnetic properties of ultrathin Co films on Si (111)
Authors: Xu, H. 
Huan, A.C.H. 
Wee, A.T.S. 
Tong, D.M.
Keywords: A. Magnetic thin film
B. Molecular beam epitaxy
C. Surface structure
Issue Date: Jun-2003
Citation: Xu, H., Huan, A.C.H., Wee, A.T.S., Tong, D.M. (2003-06). Magnetic properties of ultrathin Co films on Si (111). Solid State Communications 126 (12) : 659-664. ScholarBank@NUS Repository.
Abstract: Ultrathin cobalt films on clean (7 × 7) and Au covered Si (111) substrates were prepared by molecular beam epitaxy. The structure was studied by using scanning tunnelling microscopy and low energy electron diffraction. Magnetic properties were determined with the magneto-optic Kerr effect. It was found that Co nucleates in grains that prefer to grow along the bunched step edges of the Si substrate ([112̄] direction), which induces a strong in-plane uniaxial anisotropy. By introducing Au buffer layers, the magnetic characteristics were improved by preventing the silicide reaction between Si and Co. Moreover, the tendency for step decoration disappears gradually results in the in-plane uniaxial anisotropy reduction. © 2003 Elsevier Science Ltd. All rights reserved.
Source Title: Solid State Communications
ISSN: 00381098
DOI: 10.1016/S0038-1098(03)00307-7
Appears in Collections:Staff Publications

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