Please use this identifier to cite or link to this item:
https://doi.org/10.1016/S0038-1101(03)00008-X
DC Field | Value | |
---|---|---|
dc.title | Effects of first rapid thermal annealing temperature on Co silicide formation | |
dc.contributor.author | Peng, H.J. | |
dc.contributor.author | Shen, Z.X. | |
dc.contributor.author | Lim, E.H. | |
dc.contributor.author | Lai, C.W. | |
dc.contributor.author | Liu, R. | |
dc.contributor.author | Wee, A.T.S. | |
dc.contributor.author | Sameer, A. | |
dc.contributor.author | Dai, J.Y. | |
dc.contributor.author | Zhang, B.C. | |
dc.contributor.author | Zheng, J.Z. | |
dc.date.accessioned | 2014-12-12T07:48:20Z | |
dc.date.available | 2014-12-12T07:48:20Z | |
dc.date.issued | 2003-08 | |
dc.identifier.citation | Peng, H.J., Shen, Z.X., Lim, E.H., Lai, C.W., Liu, R., Wee, A.T.S., Sameer, A., Dai, J.Y., Zhang, B.C., Zheng, J.Z. (2003-08). Effects of first rapid thermal annealing temperature on Co silicide formation. Solid-State Electronics 47 (8) : 1249-1253. ScholarBank@NUS Repository. https://doi.org/10.1016/S0038-1101(03)00008-X | |
dc.identifier.issn | 00381101 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/116312 | |
dc.description.abstract | Cobalt silicide formation has been shown to be improved by a reactive Ti capping layer. We investigated the effects of the first rapid thermal anneal (RTA1) temperature on the silicidation mechanism and CoSi2 film properties. It was found that a higher RTA1 temperature results in lower sheet resistance, a smoother CoSi2/Si interface and better film thermal stability. The improved thermal stability may be explained by the smoother CoSi2/Si interface at higher RTA1 temperature. © 2003 Elsevier Science Ltd. All rights reserved. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/S0038-1101(03)00008-X | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | INSTITUTE OF ENGINEERING SCIENCE | |
dc.contributor.department | PHYSICS | |
dc.description.doi | 10.1016/S0038-1101(03)00008-X | |
dc.description.sourcetitle | Solid-State Electronics | |
dc.description.volume | 47 | |
dc.description.issue | 8 | |
dc.description.page | 1249-1253 | |
dc.description.coden | SSELA | |
dc.identifier.isiut | 000183226500001 | |
Appears in Collections: | Staff Publications |
Show simple item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.