Please use this identifier to cite or link to this item:
Title: 3D deep X-ray lithography for producing a multi-channel Fourier transform interferometer
Authors: Heussler, S.P. 
Moser, H.O.
Kalaiselvi, S.M.P. 
Issue Date: 2013
Citation: Heussler, S.P., Moser, H.O., Kalaiselvi, S.M.P. (2013). 3D deep X-ray lithography for producing a multi-channel Fourier transform interferometer. Microsystem Technologies 19 (3) : 335-341. ScholarBank@NUS Repository.
Abstract: We introduce a modified LIGA process architecture to manufacture a static lamellar grating Fourier-transform spectrometer invented by Moser and Möller (European patent EP 0 765 488 B1, 1994). Such spectrometers hold unique advantages over common Michelson-type FTIRs including high time resolution, speed, compactness, and robustness. To cope with the spectrometer's demand for precise high-aspect-ratio micro-fabrication, we present a modified LIGA process which enhances the X-ray lithography by means of a moving mask technique (Heussler and Moser Lithography method and apparatus PCT/SG2011/000376, 2011). The technique relies on independently moving multiple masks stacked on top of each other during the lithographic step and thus allows to locally vary the deposited dose in a positive tone photoresist. First manufacturing results as well as a performance test of a prototype spectrometer are reported. © 2012 Springer-Verlag.
Source Title: Microsystem Technologies
ISSN: 09467076
DOI: 10.1007/s00542-012-1557-2
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.


checked on May 20, 2020


checked on May 20, 2020

Page view(s)

checked on May 23, 2020

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.