Please use this identifier to cite or link to this item: https://doi.org/10.1007/s00542-012-1557-2
Title: 3D deep X-ray lithography for producing a multi-channel Fourier transform interferometer
Authors: Heussler, S.P. 
Moser, H.O.
Kalaiselvi, S.M.P. 
Issue Date: 2013
Citation: Heussler, S.P., Moser, H.O., Kalaiselvi, S.M.P. (2013). 3D deep X-ray lithography for producing a multi-channel Fourier transform interferometer. Microsystem Technologies 19 (3) : 335-341. ScholarBank@NUS Repository. https://doi.org/10.1007/s00542-012-1557-2
Abstract: We introduce a modified LIGA process architecture to manufacture a static lamellar grating Fourier-transform spectrometer invented by Moser and Möller (European patent EP 0 765 488 B1, 1994). Such spectrometers hold unique advantages over common Michelson-type FTIRs including high time resolution, speed, compactness, and robustness. To cope with the spectrometer's demand for precise high-aspect-ratio micro-fabrication, we present a modified LIGA process which enhances the X-ray lithography by means of a moving mask technique (Heussler and Moser Lithography method and apparatus PCT/SG2011/000376, 2011). The technique relies on independently moving multiple masks stacked on top of each other during the lithographic step and thus allows to locally vary the deposited dose in a positive tone photoresist. First manufacturing results as well as a performance test of a prototype spectrometer are reported. © 2012 Springer-Verlag.
Source Title: Microsystem Technologies
URI: http://scholarbank.nus.edu.sg/handle/10635/113047
ISSN: 09467076
DOI: 10.1007/s00542-012-1557-2
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