Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.tsf.2009.03.065
DC FieldValue
dc.titleStructure and magnetic characterizations of cobalt ferrite films prepared by spray pyrolysis
dc.contributor.authorPhua, L.X.
dc.contributor.authorXu, F.
dc.contributor.authorMa, Y.G.
dc.contributor.authorOng, C.K.
dc.date.accessioned2014-11-28T01:52:46Z
dc.date.available2014-11-28T01:52:46Z
dc.date.issued2009-08-31
dc.identifier.citationPhua, L.X., Xu, F., Ma, Y.G., Ong, C.K. (2009-08-31). Structure and magnetic characterizations of cobalt ferrite films prepared by spray pyrolysis. Thin Solid Films 517 (20) : 5858-5861. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2009.03.065
dc.identifier.issn00406090
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/111486
dc.description.abstractCobalt ferrite films were prepared by spray pyrolysis with post-annealing. For the as-deposited film, the differential scanning calorimetry measurement shows a crystallization peak at around 375 °C during the isochronal heating at 20 °C/min, and the X-ray diffraction pattern shows its amorphous-like characteristic. The isothermal post-annealings were performed for 2 h at various temperatures from 400 to 700 °C, leading to the crystallization of films, forming the spinel structure. The cross-sectional analysis with scanning electron microscopy shows that the film's thickness keeps almost constant after annealing, and the layered granular structure appears when the annealing temperature is high. The magnetic hysteresis loops of as-deposited and annealed films show that both the saturation magnetization and coercivity increase with the annealing temperature, due to the crystallization of CoFe2O4 phase. © 2009 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.tsf.2009.03.065
dc.sourceScopus
dc.subjectCobalt ferrite
dc.subjectMagnetic properties
dc.subjectScanning electron microscopy
dc.subjectSpray pyrolysis
dc.subjectX-ray diffraction
dc.typeArticle
dc.contributor.departmentTEMASEK LABORATORIES
dc.contributor.departmentPHYSICS
dc.description.doi10.1016/j.tsf.2009.03.065
dc.description.sourcetitleThin Solid Films
dc.description.volume517
dc.description.issue20
dc.description.page5858-5861
dc.description.codenTHSFA
dc.identifier.isiut000267725100013
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