Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.jallcom.2011.12.164
DC FieldValue
dc.titleInvestigation of the microstructure, magnetic and microwave properties of electrodeposited Ni xFe 1-x(x = 0.2-0.76) films
dc.contributor.authorPhua, L.X.
dc.contributor.authorPhuoc, N.N.
dc.contributor.authorOng, C.K.
dc.date.accessioned2014-11-28T01:52:01Z
dc.date.available2014-11-28T01:52:01Z
dc.date.issued2012-04-15
dc.identifier.citationPhua, L.X., Phuoc, N.N., Ong, C.K. (2012-04-15). Investigation of the microstructure, magnetic and microwave properties of electrodeposited Ni xFe 1-x(x = 0.2-0.76) films. Journal of Alloys and Compounds 520 : 132-139. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jallcom.2011.12.164
dc.identifier.issn09258388
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/111421
dc.description.abstractThe microstructure, magnetic properties and microwave characteristics of NiFe films were investigated with chemical composition variation. It was found that Ni concentration has a strong influence on film stress and film surface roughness which induces variations in static and dynamic anisotropy field. Also, with the variation of Ni concentration, there is a spin-reorientation behavior which may be attributed to the contribution of the magnetic anisotropy originating from the composition gradient and the anisotropy induced by deposition field. Ferromagnetic resonance and rotatable magnetic anisotropy were observed for Ni xFe 1-x (x = 0.51-0.76) films. The results were discussed based on Landau-Lifshitz-Gilbert equation and magnetic ripple theory. The rotatable anisotropy field was highly correlated to the film surface roughness. The ferromagnetic resonance varied from 0.589 to 0.886 GHz as Ni concentration was increased from 0.51 to 0.76 wt. ratio. © 2011 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.jallcom.2011.12.164
dc.sourceScopus
dc.subjectMagnetic measurements
dc.subjectThin films
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.contributor.departmentTEMASEK LABORATORIES
dc.description.doi10.1016/j.jallcom.2011.12.164
dc.description.sourcetitleJournal of Alloys and Compounds
dc.description.volume520
dc.description.page132-139
dc.description.codenJALCE
dc.identifier.isiut000300841600021
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