Please use this identifier to cite or link to this item: https://doi.org/10.1093/jmicro/50.6.545
Title: Reactive epitaxy of Co nanoparticles on (111)Si
Authors: Yeadon, M. 
Zimmermann, C.G.
Averback, R.S.
Keywords: Cobalt silicide
In-situ TEM
Inert gas condensation
Nanoparticles
Reactive epitaxy
Issue Date: 2001
Citation: Yeadon, M., Zimmermann, C.G., Averback, R.S. (2001). Reactive epitaxy of Co nanoparticles on (111)Si. Journal of Electron Microscopy 50 (6) : 545-548. ScholarBank@NUS Repository. https://doi.org/10.1093/jmicro/50.6.545
Abstract: The formation of epitaxial CoSi2 islands of nanoscopic dimensions is reported using the technique of reactive cluster deposition. Co clusters in the size range 5-50 nm were synthesized by sputtering of a high purity Co target inside a ultra high vacuum (UHV) sputtering chamber, using the technique of inert gas condensation. The clusters were then deposited on the reconstructed Si (111) surface. Upon annealing, the particles reacted with the Si substrate to form epitaxial CoSi2. Our observations were made using a JEOL 200CX transmission electron microscope modified for in situ sputtering and UHV conditions.
Source Title: Journal of Electron Microscopy
URI: http://scholarbank.nus.edu.sg/handle/10635/107299
ISSN: 00220744
DOI: 10.1093/jmicro/50.6.545
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