Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1938249
DC FieldValue
dc.titleStudy on anomalous n -type conduction of P-doped ZnO using P2 O5 dopant source
dc.contributor.authorYu, Z.G.
dc.contributor.authorGong, H.
dc.contributor.authorWu, P.
dc.date.accessioned2014-10-29T08:41:05Z
dc.date.available2014-10-29T08:41:05Z
dc.date.issued2005-05-23
dc.identifier.citationYu, Z.G., Gong, H., Wu, P. (2005-05-23). Study on anomalous n -type conduction of P-doped ZnO using P2 O5 dopant source. Applied Physics Letters 86 (21) : 1-3. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1938249
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/107216
dc.description.abstractThe unexpected n -type conduction observed in P-doped ZnO thin films fabricated from rf magnetron sputtering, was studied systematically through a combined approach of experiment and computer modeling. The carrier stability was predicted from first-principles density functional theory and chemical thermodynamic calculations. It demonstrated that, under oxygen-poor growth condition and low temperature, the stable doping defect PO -1 may have negative effect on n -type conduction and, under oxygen-poor growth condition and high temperature, the stable doping defect may contribute significantly to the n -type conduction. Furthermore, under oxygen-rich growth condition, the stable doping defect PZn1 may help to maintain the n -type conduction at high oxygen partial pressures. Our model predictions are in good agreement with experimental observations in anomalous conduction of P2 O5 -doped ZnO thin films and provide scientific explanation. This research not only revealed increased fundamental understanding on electronic behaviors but also provided a fabrication strategy for P-doped n -type ZnO. © 2005 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1938249
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE
dc.description.doi10.1063/1.1938249
dc.description.sourcetitleApplied Physics Letters
dc.description.volume86
dc.description.issue21
dc.description.page1-3
dc.description.codenAPPLA
dc.identifier.isiut000229544200049
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