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Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0928-4931(01)00279-X
DC FieldValue
dc.titleMo and W doping effects on CoCrPt thin films
dc.contributor.authorJin, D.
dc.contributor.authorWang, J.P.
dc.contributor.authorHan, Q.
dc.contributor.authorGong, H.
dc.date.accessioned2014-10-29T08:39:49Z
dc.date.available2014-10-29T08:39:49Z
dc.date.issued2001-10-20
dc.identifier.citationJin, D., Wang, J.P., Han, Q., Gong, H. (2001-10-20). Mo and W doping effects on CoCrPt thin films. Materials Science and Engineering C 16 (1-2) : 75-79. ScholarBank@NUS Repository. https://doi.org/10.1016/S0928-4931(01)00279-X
dc.identifier.issn09284931
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/107125
dc.description.abstractMo and W doping CoCrPt-based magnetic thin films were fabricated by means of DC magnetron sputtering method. It was observed that a small amount of Mo and W doping could increase coercivity (Hc) and, at the same time, maintain a lower Pt concentration. The roles of Mo and W were analyzed on the basis of structural and magnetic properties. The study reveals that W was more likely to distribute at the grain boundaries and Mo was comparably randomly distributed. © 2001 Elsevier Science B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/S0928-4931(01)00279-X
dc.sourceScopus
dc.subjectCoercivity
dc.subjectDoping
dc.subjectMo
dc.subjectS*
dc.subjectSegregation
dc.subjectW
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE
dc.description.doi10.1016/S0928-4931(01)00279-X
dc.description.sourcetitleMaterials Science and Engineering C
dc.description.volume16
dc.description.issue1-2
dc.description.page75-79
dc.identifier.isiut000171736900015
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