Magnetic and hardness properties of nanostructured Ni-Co films deposited by a nonaqueous electroless method

Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/107095

DC Field	Value
dc.title	Magnetic and hardness properties of nanostructured Ni-Co films deposited by a nonaqueous electroless method
dc.contributor.author	Chow, G.M.
dc.contributor.author	Ding, J.
dc.contributor.author	Zhang, J.
dc.contributor.author	Lee, K.Y.
dc.contributor.author	Surani, D.
dc.contributor.author	Lawrence, S.H.
dc.date.accessioned	2014-10-29T08:39:25Z
dc.date.available	2014-10-29T08:39:25Z
dc.date.issued	1999-03-29
dc.identifier.citation	Chow, G.M.,Ding, J.,Zhang, J.,Lee, K.Y.,Surani, D.,Lawrence, S.H. (1999-03-29). Magnetic and hardness properties of nanostructured Ni-Co films deposited by a nonaqueous electroless method. Applied Physics Letters 74 (13) : 1889-1891. ScholarBank@NUS Repository.
dc.identifier.issn	00036951
dc.identifier.uri	http://scholarbank.nus.edu.sg/handle/10635/107095
dc.description.abstract	Nanostructured NixCo100-x films with high magnetization and magnetic anisotropy are prepared by deposition on Cu substrates using a solution chemistry method. The deposition occurred both on conductor and insulator substrate planar or complex surfaces without any predeposition surface treatment. Magnetic and mechanical properties of these and other materials are optimized.
dc.source	Scopus
dc.type	Article
dc.contributor.department	MATERIALS SCIENCE
dc.description.sourcetitle	Applied Physics Letters
dc.description.volume	74
dc.description.issue	13
dc.description.page	1889-1891
dc.description.coden	APPLA
dc.identifier.isiut	NOT_IN_WOS
Appears in Collections:	Staff Publications

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