Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.tsf.2004.01.079
DC FieldValue
dc.titleFerroelectric and dielectric properties of 0.6SrBi 2Nb 2O 9-0.4BiFeO 3 thin films
dc.contributor.authorXue, J.M.
dc.contributor.authorSim, M.H.
dc.contributor.authorEzhilvalavan, S.
dc.contributor.authorZhou, Z.H.
dc.contributor.authorWang, J.
dc.contributor.authorZhu, H.
dc.contributor.authorMiao, J.M.
dc.date.accessioned2014-10-29T08:38:35Z
dc.date.available2014-10-29T08:38:35Z
dc.date.issued2004-07-22
dc.identifier.citationXue, J.M., Sim, M.H., Ezhilvalavan, S., Zhou, Z.H., Wang, J., Zhu, H., Miao, J.M. (2004-07-22). Ferroelectric and dielectric properties of 0.6SrBi 2Nb 2O 9-0.4BiFeO 3 thin films. Thin Solid Films 460 (1-2) : 1-6. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2004.01.079
dc.identifier.issn00406090
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/107038
dc.description.abstractIn this paper, we report the formation and ferroelectric properties of 0.6SrBi 2Nb 2O 9-0.4BiFeO 3 thin films with layered perovskite structure on Pt/Si substrate, which were prepared via a sol-gel route. The single-phase layered perovskite structure was developed at 750 °C, while to a high annealing temperature, such as at 800 °C, generated a fluorite structure due to the evaporation of Bi 2O 3. The 0.6SrBi 2Nb 2O 9-0.4BiFeO 3 film annealed at 750 °C demonstrated a dense structural morphology and exhibited the wanted ferroelectric and dielectric properties. When measured at an applied field of 225 kV/cm, it showed a remanent polarization (2P r) of 5.5 μC/cm 2 and a coercive field (2E c) of 65.6 kV/cm, respectively, together with a leakage current density of 5×10 -8 A/cm 2 at 125 kV/cm. Its dielectric constant and dielectric loss factor were ∼130 and ∼2%, respectively, measured at the frequency of 1 MHz and at room temperature. © 2004 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.tsf.2004.01.079
dc.sourceScopus
dc.subject0.6SrBi 2Nb 2O 9-0.4BiFeO 3
dc.subjectFerroelectric Thin Films
dc.subjectSol-gel route
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE
dc.description.doi10.1016/j.tsf.2004.01.079
dc.description.sourcetitleThin Solid Films
dc.description.volume460
dc.description.issue1-2
dc.description.page1-6
dc.description.codenTHSFA
dc.identifier.isiut000222217500001
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