Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0927-7757(99)00444-6
DC FieldValue
dc.titleSeries expansion and computer simulation studies of random sequential adsorption
dc.contributor.authorWang, J.-S.
dc.date.accessioned2014-10-28T03:12:43Z
dc.date.available2014-10-28T03:12:43Z
dc.date.issued2000-05-30
dc.identifier.citationWang, J.-S. (2000-05-30). Series expansion and computer simulation studies of random sequential adsorption. Colloids and Surfaces A: Physicochemical and Engineering Aspects 165 (1-3) : 325-343. ScholarBank@NUS Repository. https://doi.org/10.1016/S0927-7757(99)00444-6
dc.identifier.issn09277757
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/104857
dc.description.abstractWe discuss two important techniques; series expansion and Monte Carlo simulation, for a random sequential adsorption study. Random sequential adsorption is an idealization for surface deposition where the time scale of particle relaxation is much longer than the time scale of deposition. Particles are represented as extended objects which are adsorbed onto a continuum surface or lattice sites. Once landed on the surface, the particles stick to the surface. We review in some detail, various methods of computing the coverage θ(t) and present some of the recent and new results in random sequential adsorption. (C) 2000 Elsevier Science B.V.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/S0927-7757(99)00444-6
dc.sourceScopus
dc.subjectDeposition
dc.subjectLattice site
dc.subjectParticle relaxation
dc.subjectRandom sequential adsorption
dc.typeArticle
dc.contributor.departmentCOMPUTATIONAL SCIENCE
dc.description.doi10.1016/S0927-7757(99)00444-6
dc.description.sourcetitleColloids and Surfaces A: Physicochemical and Engineering Aspects
dc.description.volume165
dc.description.issue1-3
dc.description.page325-343
dc.description.codenCPEAE
dc.identifier.isiut000085501200019
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