Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.762771
Title: An all-silicon channel waveguide fabricated using direct proton beam writing
Authors: Teo, E.J. 
Bettiol, A.A. 
Breese, M.B.H. 
Yang, P.Y.
Mashanovich, G.Z.
Headley, W.R.
Reed, G.T.
Blackwood, D.J.
Keywords: Porous silicon
Proton beam writing
Silicon photonics
Waveguides
Issue Date: 2008
Citation: Teo, E.J., Bettiol, A.A., Breese, M.B.H., Yang, P.Y., Mashanovich, G.Z., Headley, W.R., Reed, G.T., Blackwood, D.J. (2008). An all-silicon channel waveguide fabricated using direct proton beam writing. Proceedings of SPIE - The International Society for Optical Engineering 6898 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.762771
Abstract: We report a novel technique for the fabrication of an all-silicon channel waveguide using direct proton beam writing and subsequent electrochemical etching. A focused beam of high energy protons is used to selectively inhibit porous silicon formation in the irradiated regions. By over-etching beyond the ion range, the irradiated region becomes surrounded by porous silicon cladding. Waveguide characterization carried out at 1550 nm on the proton irradiated waveguide shows that the propagation losses improve significantly from 20±2 dB/cm to 9±2 dB/cm after vacuum annealing at 800°C for 1 hour.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/98634
ISBN: 9780819470737
ISSN: 0277786X
DOI: 10.1117/12.762771
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