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|Title:||An all-silicon channel waveguide fabricated using direct proton beam writing|
|Authors:||Teo, E.J. |
Proton beam writing
|Citation:||Teo, E.J., Bettiol, A.A., Breese, M.B.H., Yang, P.Y., Mashanovich, G.Z., Headley, W.R., Reed, G.T., Blackwood, D.J. (2008). An all-silicon channel waveguide fabricated using direct proton beam writing. Proceedings of SPIE - The International Society for Optical Engineering 6898 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.762771|
|Abstract:||We report a novel technique for the fabrication of an all-silicon channel waveguide using direct proton beam writing and subsequent electrochemical etching. A focused beam of high energy protons is used to selectively inhibit porous silicon formation in the irradiated regions. By over-etching beyond the ion range, the irradiated region becomes surrounded by porous silicon cladding. Waveguide characterization carried out at 1550 nm on the proton irradiated waveguide shows that the propagation losses improve significantly from 20±2 dB/cm to 9±2 dB/cm after vacuum annealing at 800°C for 1 hour.|
|Source Title:||Proceedings of SPIE - The International Society for Optical Engineering|
|Appears in Collections:||Staff Publications|
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