Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/98454
Title: Transverse diffusion measurements and Monte Carlo simulation studies of Rb+ ions in Kr and Xe
Authors: Tan, T.L. 
Ong, P.P. 
Issue Date: 1995
Source: Tan, T.L.,Ong, P.P. (1995). Transverse diffusion measurements and Monte Carlo simulation studies of Rb+ ions in Kr and Xe. The Journal of Chemical Physics 103 (11) : 4519-4523. ScholarBank@NUS Repository.
Abstract: The ratio of the transverse diffusion coefficient to the mobility (D T/K) for Rb+ ions drifting in Kr and Xe gases at about 303 K has been measured at electric field to neutral gas density ratio (E/N) values ranging from 5 to 500 Td. Calculations of the reduced mobility (K0) and the ratios of the longitudinal and transverse diffusion coefficients to mobility (DL/K and DT/K, respectively) for both Rb +-Kr and Rb+-Xe systems were made using a Monte Carlo simulation (MCS) technique and the interaction potential of Koutselos, Mason, and Viehland [J. Chem. Phys. 93, 7125 (1990)]. Furthermore, DL/K and DT/K values were derived from K0 values obtained from the present MCS calculations and from experimental results reported in the literature, using the generalized Einstein relations which are based on the three-temperature theory. For the Rb+-Kr system, the experimental values of DT/K were found to be 2%-4% higher than those from MCS calculations for EIN values above 120 Td. For the Rb+-Xe system, the experimental DT/K values were similarly higher than the MCS values in the range 90-220 Td. Given that the standard error of the experimental measurements of DT/K is estimated to be better than 3% and that of the MCS calculations is better than 2.5%, the agreement between the present experimental DT/K data and those from MCS calculations can be considered to be fairly good. The interaction potential of Koutselos, Mason, and Viehland therefore appears to represent well the actual potential for both Rb+-Kr and Rb+-Xe systems. © 1995 American Institute of Physics.
Source Title: The Journal of Chemical Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/98454
ISSN: 00219606
Appears in Collections:Staff Publications

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