Please use this identifier to cite or link to this item:
|Title:||Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating|
|Authors:||Ansari, K. |
Van Kan, J.A.
|Citation:||Ansari, K., Van Kan, J.A., Bettiol, A.A., Watt, F. (2006-10-01). Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating. Journal of Micromechanics and Microengineering 16 (10) : 1967-1974. ScholarBank@NUS Repository. https://doi.org/10.1088/0960-1317/16/10/008|
|Abstract:||In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that utilizes high-quality nickel stamps with micron features down to sub-100 nm, made using proton beam writing coupled with nickel sulfamate electroplating. The fabricated stamps have a high aspect ratio, with smooth and vertical sidewalls. Nanoindentation and atomic force microscopy (AFM) measurements of the features on the surface of the stamps indicate a hardness of 5 GPa and a sidewall roughness of 7 nm. The stamps have been used for nanoimprint lithography on polymethylmethacrylate (PMMA) substrates and the imprinted patterns show a high degree of reproducibility. © 2006 IOP Publishing Ltd.|
|Source Title:||Journal of Micromechanics and Microengineering|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Nov 13, 2018
WEB OF SCIENCETM
checked on Nov 5, 2018
checked on Sep 28, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.