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https://doi.org/10.1016/j.nimb.2010.01.015
| Title: | Micromachining of amplitude and phase modulated reflective computer generated hologram patterns in silicon | Authors: | Ow, Y.S. Breese, M.B.H. Leng, Y.R. Azimi, S. Teo, E.J. Sun, X.W. |
Keywords: | Computer generated holograms Holography Ion beam irradiation Micromachining Silicon |
Issue Date: | 1-May-2010 | Citation: | Ow, Y.S., Breese, M.B.H., Leng, Y.R., Azimi, S., Teo, E.J., Sun, X.W. (2010-05-01). Micromachining of amplitude and phase modulated reflective computer generated hologram patterns in silicon. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 268 (9) : 1416-1421. ScholarBank@NUS Repository. https://doi.org/10.1016/j.nimb.2010.01.015 | Abstract: | Silicon has been machined on lateral resolutions of micrometers and on depth resolutions of nanometers using a recently-developed process based on ion irradiation and electrochemical anodisation. Here we investigate its use as a recording medium for computer generated hologram patterns. We describe the fabrication of both amplitude and phase binary modulated reflective computer generated hologram patterns on a silicon surface with pixel sizes of 5 μm. We further discuss the use of micromachined silicon to variably modulate both amplitude and phase in a continuous, rather than a binary fashion. © 2010 Elsevier B.V. All rights reserved. | Source Title: | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | URI: | http://scholarbank.nus.edu.sg/handle/10635/97194 | ISSN: | 0168583X | DOI: | 10.1016/j.nimb.2010.01.015 |
| Appears in Collections: | Staff Publications |
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