Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.nimb.2010.01.015
Title: Micromachining of amplitude and phase modulated reflective computer generated hologram patterns in silicon
Authors: Ow, Y.S. 
Breese, M.B.H. 
Leng, Y.R.
Azimi, S.
Teo, E.J. 
Sun, X.W.
Keywords: Computer generated holograms
Holography
Ion beam irradiation
Micromachining
Silicon
Issue Date: 1-May-2010
Citation: Ow, Y.S., Breese, M.B.H., Leng, Y.R., Azimi, S., Teo, E.J., Sun, X.W. (2010-05-01). Micromachining of amplitude and phase modulated reflective computer generated hologram patterns in silicon. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 268 (9) : 1416-1421. ScholarBank@NUS Repository. https://doi.org/10.1016/j.nimb.2010.01.015
Abstract: Silicon has been machined on lateral resolutions of micrometers and on depth resolutions of nanometers using a recently-developed process based on ion irradiation and electrochemical anodisation. Here we investigate its use as a recording medium for computer generated hologram patterns. We describe the fabrication of both amplitude and phase binary modulated reflective computer generated hologram patterns on a silicon surface with pixel sizes of 5 μm. We further discuss the use of micromachined silicon to variably modulate both amplitude and phase in a continuous, rather than a binary fashion. © 2010 Elsevier B.V. All rights reserved.
Source Title: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
URI: http://scholarbank.nus.edu.sg/handle/10635/97194
ISSN: 0168583X
DOI: 10.1016/j.nimb.2010.01.015
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